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Stepper Exposure

SMEE

300 Series Stepper —— LED/ MEMS/ Power Devices


                                                                     
  SSB300

    
  SSB320

    
  SSB380


SSB300/30 stepper is designed for substrates of 2-6 inches applied in PSS and electrode lithography process. It has high resolution and CD uniformity. SSB320/10 is specially designed for LED Chip lithography process. Ultra-large exposure field is adopted. With optimized reticle design, the exposure field is smaller, so that the loss of repeated chips is reduced and the throughput is improved greatly.

   Product Features

Resolution up to 0.8μm

Fast online mapping tech

Precise stitching

Self-adaption switching between different substrates

High throughput

Precise overlay

Perfectly match with aligner

   Specifications

 Model

 SSB300

 SSB320

 SSB380

 Resolution

 0.8μm

 2μm

 1μm

 Light Source

 i-line mercury lamp

 i-line mercury lamp

i-line mercury lamp

 Substrate Size

 26 inches

 26 inches

 26 inches

 Remark

 LED PAD and PSS Process

 LED PAD Process

 LED PAD Process

 Option

 Backside alignment and variable slit

Backside alignment and variable slit

Backside alignment and variable slit

 


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